Nicholas A Ryza

6928746, Aug 16, 2005

Feb 14, 2003

10/367080

Chantal J. Arena-Foster - Mesa AZ, US
Allan Wendell Awtrey - Fort Worth TX, US
Nicholas Alan Ryza - Austin TX, US
Paul Schilling - Granite Bay CA, US

Tokyo Electron Limited - Tokyo

F26B003/00

34351, 34 78, 430311

A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the object. The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath. A drying process is performed.

6953654, Oct 11, 2005

Mar 14, 2002

10/063049

Nicholas A. Ryza - Austin TX, US
Allan W. Awtrey - Fort Worth TX, US

Tokyo Electron Limited - Tokyo

G03F007/42

430322, 430325, 430329, 430331, 134 1

Contaminant removal from a substrate can be performed using a supercritical fluid. An apparatus can be configured to operate at conditions that take advantage of higher solubility of a contaminant in its supercritical state compared to its liquid state. The substrate can be exposed to a supercritical fluid in a chamber to remove at least some of the contaminant. Outside the chamber, the supercritical fluid can be cooled to its corresponding liquid state, in which lower solubility of the contaminant may allow the contaminant to separate into a different phase from the liquid phase of the supercritical fluid. Such contaminant removal can be highly advantageous to substrates that withstand only limited amounts of physical or mechanical stress or heat. The contaminant removal can also be used where geometries virtually prevent removal by physical or mechanical means.

7044662, May 16, 2006

Aug 3, 2004

10/911085

Chantal J. Arena-Foster - Mesa AZ, US
Allan Wendell Awtrey - Forth Worth TX, US
Nicholas Alan Ryza - Austin TX, US
Paul Schilling - Granite Bay CA, US

Tokyo Electron Limited - Tokyo

G03D 5/00

396611, 396627, 134 1, 134 3, 134 31

An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.

20040072706, Apr 15, 2004

Mar 21, 2003

10/394802

Chantal Arena-Foster - Mesa AZ, US
Allan Awtrey - Fort Worth TX, US
Nicholas Ryza - Austin TX, US
Paul Schilling - Granite Bay CA, US

C11D001/00

510/175000

A method of cleaning a surface of an object is disclosed. The object is placed onto a support region within a pressure chamber. The pressure chamber is then pressurized. A cleaning process is performed. A series of decompression cycles are performed. The pressure chamber is then vented.

20080099463, May 1, 2008

Sep 29, 2006

11/537096

Nicholas Alan Ryza - Austin TX, US

TOKYO ELECTRON LIMITED - Tokyo

H05B 3/68

21944811

A method and processing system for controlling and rapidly lowering the temperature of a hotplate used for supporting and heat-treating wafers. The method includes maintaining the hotplate at a first hotplate temperature by applying a first heating power to the hotplate and heat-treating a wafer on an upper surface of the hotplate, removing the heat-treated wafer from the upper surface, exposing the upper surface to an inert gas stream for rapid cool down of the hotplate from the first hotplate temperature to a second hotplate temperature, and maintaining the hotplate at the second hotplate temperature by applying a second heating power to the hotplate and heat-treating another wafer on the upper surface of the hotplate.

6924086, Aug 2, 2005

Feb 14, 2003

10/367078

Chantal J. Arena-Foster - Mesa AZ, US
Allan Wendell Awtrey - Forth Worth TX, US
Nicholas Alan Ryza - Austin TX, US
Paul Schilling - Granite Bay CA, US

Tokyo Electron Limited - Tokyo

G03F007/30

430311, 430322

A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.